Thursday, November 07, 2013

Axcelis on Image Sensor Manufacturing Challenges

Axcelis published a nice video lecture on high energy implants in image sensor manufacturing:

2 comments:

  1. The deep Pwell is under STI which is amorphous material. In this case, all the channel effect should be suppressed. Is the deep Pwell implanted before STI fill ? In this case, how to fill STI in low temperature ?

    -yang ni

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  2. I think he means channeling effect outwards into the photodiode region which will give variation in the full-well capacity/responsivity

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